In the field of electronic design automation (EDA), the complexity of very large-scale integrated (VLSI) design is increasing due to the down-scaling of CMOS technology. To address this challenge, researchers have been exploring the application of machine learning (ML) techniques in EDA since the 1990s. However, recent breakthroughs in ML and the growing complexity of EDA tasks have sparked renewed interest in incorporating ML to solve these challenges. In their paper titled "Machine Learning for Electronic Design Automation: A Survey," authors Guyue Huang, Jingbo Hu, Yifan He, Jialong Liu, Mingyuan Ma, Zhaoyang Shen, Juejian Wu, Yuanfan Xu, Hengrui Zhang, Kai Zhong, Xuefei Ning, Yuzhe Ma, Haoyu Yang, Bei Yu, Huazhong Yang and Yu Wang present a comprehensive review of existing ML studies for EDA. The authors organize their review following the EDA hierarchy and highlight that with advancements in CMOS technology leading to smaller feature sizes and increased transistor densities on chips traditional design methodologies face significant challenges. This necessitates exploring new approaches such as ML to improve various aspects of EDA tasks. The paper discusses how ML techniques can be applied at different levels of the EDA hierarchy including circuit synthesis and optimization by automating design space exploration and improving power consumption efficiency; physical design automation by optimizing placement and routing algorithms for improved performance; timing analysis and verification tasks by identifying critical paths and estimating timing delays accurately; functional verification by automating test generation and accelerating simulation processes; fault diagnosis and yield optimization by detecting faults in integrated circuits to improve reliability as well as optimizing manufacturing processes to enhance chip yield and reduce costs. Overall this survey paper provides a comprehensive overview of existing research on ML for EDA organized based on the EDA hierarchy offering valuable insights into how ML techniques can be effectively applied to address the increasing complexity of VLSI design. This work serves as a valuable resource for researchers and practitioners in the field guiding future developments and advancements in ML-based EDA methodologies.
- - Complexity of VLSI design is increasing due to down-scaling of CMOS technology
- - Machine learning (ML) techniques have been explored in EDA since the 1990s
- - Recent breakthroughs in ML and growing complexity of EDA tasks have renewed interest in incorporating ML
- - "Machine Learning for Electronic Design Automation: A Survey" provides a comprehensive review of existing ML studies for EDA
- - ML can be applied at different levels of the EDA hierarchy, including circuit synthesis and optimization, physical design automation, timing analysis and verification, functional verification, fault diagnosis and yield optimization
- - The paper offers valuable insights into how ML techniques can address the increasing complexity of VLSI design
- - Serves as a valuable resource for researchers and practitioners in the field.
VLSI design is getting more complicated because of making computer chips smaller. People have been using machine learning in designing computer chips since the 1990s. Now, with new advancements in machine learning and more complex tasks in chip design, people are interested in using machine learning again. A survey called "Machine Learning for Electronic Design Automation: A Survey" talks about all the studies that have been done on using machine learning for chip design. Machine learning can be used at different stages of chip design to make it better and faster. This survey paper is helpful for researchers and people who work on designing computer chips."
Definitions - VLSI design: The process of creating very small computer chips.
- Machine learning: Using computers to learn from data and make decisions without being specifically programmed.
- EDA: Electronic Design Automation, which is the field of designing electronic systems like computer chips.
- Breakthroughs: Important discoveries or achievements.
- Hierarchy: A system where things are organized based on their importance or level.
- Synthesis: Creating something by combining different parts together.
- Optimization: Making something as good as possible.
- Physical design automation: Using computers to help with the physical layout of a computer chip.
- Timing analysis and verification: Checking if a computer chip will work correctly within a certain time frame.
- Functional verification: Making sure that a computer chip works correctly according to its intended function.
- Fault diagnosis: Finding
Exploring the Application of Machine Learning in Electronic Design Automation
The complexity of very large-scale integrated (VLSI) design has been increasing due to the down-scaling of CMOS technology. To address this challenge, researchers have been exploring the application of machine learning (ML) techniques in electronic design automation (EDA) since the 1990s. However, recent breakthroughs in ML and the growing complexity of EDA tasks have sparked renewed interest in incorporating ML to solve these challenges. In their paper titled "Machine Learning for Electronic Design Automation: A Survey," authors Guyue Huang, Jingbo Hu, Yifan He, Jialong Liu, Mingyuan Ma, Zhaoyang Shen, Juejian Wu, Yuanfan Xu, Hengrui Zhang, Kai Zhong, Xuefei Ning , Yuzhe Ma , Haoyu Yang , Bei Yu , Huazhong Yang and Yu Wang present a comprehensive review of existing ML studies for EDA.
Organizing by EDA Hierarchy
The authors organize their review following the EDA hierarchy and highlight that with advancements in CMOS technology leading to smaller feature sizes and increased transistor densities on chips traditional design methodologies face significant challenges. This necessitates exploring new approaches such as ML to improve various aspects of EDA tasks. The paper discusses how ML techniques can be applied at different levels of the EDA hierarchy including circuit synthesis and optimization by automating design space exploration and improving power consumption efficiency; physical design automation by optimizing placement and routing algorithms for improved performance; timing analysis and verification tasks by identifying critical paths and estimating timing delays accurately; functional verification by automating test generation and accelerating simulation processes; fault diagnosis and yield optimization by detecting faults in integrated circuits to improve reliability as well as optimizing manufacturing processes to enhance chip yield reduce costs.
Conclusion
Overall this survey paper provides a comprehensive overview of existing research on ML for EDA organized based on the EDA hierarchy offering valuable insights into how ML techniques can be effectively applied to address the increasing complexity of VLSI design. This work serves as a valuable resource for researchers and practitioners in the field guiding future developments and advancements in ML-based EDA methodologies.